| US 7,557,901 B2 | ||
| Lithographic apparatus and device manufacturing method | ||
| Thimotheus Franciscus Sengers, 'S-Hertogenbosch (Netherlands); Sjoerd Nicolaas Lambertus Donders, 'S-Hertogenbosch (Netherlands); Hans Jansen, Eindhoven (Netherlands); and Arjen Boogaard, Deventer (Netherlands) | ||
| Assigned to ASML Netherlands B.V., Veldhoven (Netherlands) | ||
| Filed on Dec. 20, 2006, as Appl. No. 11/641,730. | ||
| Application 11/641730 is a continuation of application No. 10/888514, filed on Jul. 12, 2004, granted, now 7,184,122. | ||
| Claims priority of application No. 03255228 (EP), filed on Jul. 24, 2003. | ||
| Prior Publication US 2007/0097343 A1, May 03, 2007 | ||
| This patent is subject to a terminal disclaimer. | ||
| Int. Cl. G03B 27/42 (2006.01) | ||
| U.S. Cl. 355—53 | 25 Claims |
| 1. A lithographic projection apparatus arranged to project, using a projection system, a pattern from a patterning device
onto a substrate held by a substrate table, comprising:
a liquid supply system configured to provide a liquid to a space between the projection system and the substrate; and
a sensor mounted on the substrate table and configured to be exposed to electromagnetic radiation, the sensor including a
surface that is to be in contact with liquid from the liquid supply system, the surface comprising no more than one metal
type.
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