| US 7,557,362 B2 | ||
| Ion sources and methods for generating an ion beam with a controllable ion current density distribution | ||
| Rustam Yevtukhov, Briarwood, N.Y. (US); Alan V. Hayes, Great Neck, N.Y. (US); Viktor Kanarov, Bellmore, N.Y. (US); and Boris L. Druz, Brooklyn, N.Y. (US) | ||
| Assigned to Veeco Instruments Inc., Woodbury, N.Y. (US) | ||
| Filed on Feb. 26, 2007, as Appl. No. 11/678,979. | ||
| Application 11/678979 is a continuation in part of application No. 10/772132, filed on Feb. 04, 2004, granted, now 7,183,716. | ||
| Prior Publication US 2007/0194245 A1, Aug. 23, 2007 | ||
| Int. Cl. H01J 49/10 (2006.01); H01J 1/50 (2006.01); H01J 37/08 (2006.01) | ||
| U.S. Cl. 250—423R [250/424; 250/396 ML; 315/111.21; 315/111.81; 315/111.01; 118/723 I] | 34 Claims |
| 1. An ion source for a plasma processing apparatus, the ion source comprising:
a discharge chamber with a discharge space adapted to contain a working gas;
an antenna adapted to generate a plasma from the working gas inside said discharge space; and
an electromagnet disposed proximate to said discharge chamber, said electromagnet including a first pole piece formed from
a magnetically permeable material and a first coil, said first pole piece including a tubular sidewall and said first coil
located proximate to said tubular sidewall of said first pole piece, said first coil configured to be energized to generate
a magnetic field in said discharge space, and said first pole piece configured to shape the magnetic field effective for changing
a distribution of the plasma inside said discharge space.
|