| US 7,556,896 B2 | ||
| Inspection method and photomask | ||
| Kazuya Fukuhara, Tokyo (Japan); Satoshi Tanaka, Kanagawa (Japan); and Soichi Inoue, Kanagawa (Japan) | ||
| Assigned to Kabushiki Kaisha Toshiba, Tokyo (Japan) | ||
| Filed on Nov. 30, 2006, as Appl. No. 11/606,121. | ||
| Application 11/606121 is a division of application No. 10/615228, filed on Jul. 09, 2003, granted, now 7,186,485. | ||
| Claims priority of application No. P2002-203194 (JP), filed on Jul. 11, 2002. | ||
| Prior Publication US 2007/0071306 A1, Mar. 29, 2007 | ||
| Int. Cl. G03F 9/00 (2006.01) | ||
| U.S. Cl. 430—5 [430/30; 382/145] | 18 Claims |
| 1. A photomask, comprising:
a transparent substrate having a first surface and a second surface opposite to the first surface;
a first aberration measurement unit disposed on a first region of the first surface;
a second aberration measurement unit disposed on a second region of the first surface, the second region away from the first
region; and
a first polarizer disposed on the second surface so as to be opposite to the first aberration measurement unit.
|