providing a first transparent substrate with a light shielding area, comprising the steps of:

forming a scan line, a data line, and a transistor on the first transparent substrate, the scan line and the data line being respectively coupled to a gate electrode and a source electrode of the transistor;

forming a passivation layer over the first transparent substrate;

forming an organic layer including a through hole and a plurality of trenches on the passivation layer by using a single phase-shift photomask, wherein the through hole extends to the bottom of the passivation layer, and the trenches corresponds to the light shielding area; and

forming a pixel electrode on the organic layer, the pixel electrode being electrically connected to a drain electrode of the transistor via the through hole and the pixel electrode being physically and electrically separated by the trenches;

providing a second transparent substrate; and

forming a liquid crystal layer between the first transparent substrate and the second transparent substrate.