CPC G03F 7/70925 (2013.01) [G03F 1/82 (2013.01); G03F 7/70033 (2013.01); G03F 7/70916 (2013.01); H05G 2/003 (2013.01)] | 20 Claims |
16. A reticle cleaning system, comprising:
a cleaning electrode;
a debris capture film supported adjacent to the cleaning electrode and spaced apart from the cleaning electrode;
support pins extending from a surface of the cleaning electrode, wherein the support pins support the debris capture film adjacent to and spaced apart from the cleaning electrode; and
a voltage source configured draw debris from a photolithography reticle to the debris capture film by applying a voltage of alternating polarity to the cleaning electrode when the cleaning electrode is adjacent to the photolithography reticle with the debris capture film positioned between the photolithography reticle and the cleaning electrode.
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