CPC G03F 7/0045 (2013.01) [C07C 25/00 (2013.01); C07C 25/02 (2013.01); C07C 25/13 (2013.01); C07C 63/00 (2013.01); C07C 63/10 (2013.01); C07C 63/68 (2013.01); C07C 63/70 (2013.01); C08F 212/24 (2020.02); C08F 220/16 (2013.01); C08F 220/283 (2020.02); G03F 7/0046 (2013.01)] | 18 Claims |
1. A resist composition comprising
a compound represented by formula (I),
a resin having an acid-labile group,
an acid generator, and
a salt generating an acid having an acidity lower than that of an acid generated from the acid generator:
wherein, in formula (I),
R1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms,
m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other.
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