US 11,681,220 B2
Resist composition and method for producing resist pattern
Yukako Anryu, Osaka (JP); Satoshi Yamaguchi, Osaka (JP); and Koji Ichikawa, Osaka (JP)
Assigned to SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo (JP)
Filed by SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo (JP)
Filed on Feb. 15, 2021, as Appl. No. 17/175,907.
Claims priority of application No. JP2020-037661 (JP), filed on Mar. 5, 2020.
Prior Publication US 2021/0286260 A1, Sep. 16, 2021
Int. Cl. G03F 7/04 (2006.01); C07C 25/00 (2006.01); C07C 63/70 (2006.01); G03F 7/004 (2006.01); C08F 212/14 (2006.01); C08F 220/28 (2006.01); C08F 220/16 (2006.01); C07C 25/02 (2006.01); C07C 25/13 (2006.01); C07C 63/68 (2006.01); C07C 63/00 (2006.01); C07C 63/10 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 25/00 (2013.01); C07C 25/02 (2013.01); C07C 25/13 (2013.01); C07C 63/00 (2013.01); C07C 63/10 (2013.01); C07C 63/68 (2013.01); C07C 63/70 (2013.01); C08F 212/24 (2020.02); C08F 220/16 (2013.01); C08F 220/283 (2020.02); G03F 7/0046 (2013.01)] 18 Claims
 
1. A resist composition comprising
a compound represented by formula (I),
a resin having an acid-labile group,
an acid generator, and
a salt generating an acid having an acidity lower than that of an acid generated from the acid generator:

OG Complex Work Unit Chemistry
wherein, in formula (I),
R1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms,
m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other.