	US 11,681,219 B2
	Resist composition
Yechan Kim, Hwaseong-si (KR); Su Min Kim, Suwon-si (KR); Ju-Young Kim, Hwaseong-si (KR); Jinjoo Kim, Seoul (KR); Hyunwoo Kim, Seongnam-si (KR); Juhyeon Park, Suwon-si (KR); Hyunji Song, Suwon-si (KR); Songse Yi, Seoul (KR); and Suk Koo Hong, Suwon-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Aug. 12, 2020, as Appl. No. 16/991,281.
Claims priority of application No. 10-2020-0014504 (KR), filed on Feb. 6, 2020.
Prior Publication US 2021/0263411 A1, Aug. 26, 2021
Int. Cl. G03F 7/004 (2006.01); C08L 35/00 (2006.01); C07C 381/12 (2006.01); C08L 25/06 (2006.01)

CPC G03F 7/0045 (2013.01) [C07C 381/12 (2013.01); C08L 25/06 (2013.01); C08L 35/00 (2013.01)]

18 Claims

1. A resist composition, comprising:

a polymer; and

a compound represented by Formula 1,

wherein, in Formula 1,

R₁is a group represented by Formula R, and

R₂, R₃, R₄and R₅are each independently hydrogen, a halogen, a substituted or unsubstituted alkyl group having 1 to 7 carbon atoms, a substituted or unsubstituted ester group having 1 to 7 carbon atoms, a substituted or unsubstituted acetal group having 1 to 7 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 7 carbon atoms, or a substituted or unsubstituted ether group having 1 to 7 carbon atoms, R₂, R₃, R₄and R₅being separate or adjacent ones thereof are combined to form an aromatic ring having 3 to 20 carbon atoms,

provided that the compound represented by Formula 1 is not the following compound:

and

provided that when R₂and R₃are combined with each other to form an aromatic ring having 6 carbon atoms and R₄and R₅are combined with each other to form an aromatic ring having 6 carbon atoms, each aromatic ring having 6 carbon atoms is substituted with at least one of an ester group having 1 to 7 carbon atoms or an acetal group having 1 to 7 carbon atoms.