| US 7,388,216 B2 | ||
| Pattern writing and forming method | ||
| Munehiro Ogasawara, Kanagawa-Ken (Japan) | ||
| Assigned to Kabushiki Kaisha Toshiba, Tokyo (Japan) | ||
| Filed on Jun. 06, 2007, as Appl. No. 11/759,057. | ||
| Application 11/759057 is a division of application No. 10/360801, filed on Feb. 10, 2003, granted, now 7,270,921. | ||
| Claims priority of application No. 2002-031951 (JP), filed on Feb. 08, 2002. | ||
| Prior Publication US 2007/0228293 A1, Oct. 04, 2007 | ||
| Int. Cl. G03C 5/00 (2006.01); G03F 9/00 (2006.01); G21K 5/10 (2006.01); H01J 37/08 (2006.01) | ||
| U.S. Cl. 250—492.22 [250/492.3; 355/52; 355/53; 355/77; 430/5; 430/30; 430/296; 430/396; 430/942] | 14 Claims |
| 1. A pattern writing apparatus for radiating an energy beam on a resist that is applied to a target to write patterns thereon
comprising:
a memory configured to store pattern data for writing the patterns, the pattern data including a reference radiation amount
D0 for radiating the energy beam, a distribution of a pattern dependency of a pattern-size variation Δ due to a loading effect,
and an energy distribution “s” applied to the resist by the energy beam;
a first calculator configured to divide writing regions of the target into grids to provide sub-writing regions in the grids
and configured to obtain a distribution of a pattern-area density per sub-writing region based on the pattern data;
a second calculator configured to calculate a radiation amount DCf(x) for correcting a long-range fogging exposure in each sub-writing region based on the pattern-area density and the reference
radiation amount D0;
a third calculator configured to calculate a radiation amount DCp(x) for correcting a proximity effect applied to those of the patterns in each sub-writing region based on the pattern data
and the reference radiation amount D0;
a fourth calculator configured to calculate a radiation amount D(x) based on the radiation amount DCf(x) the radiation amount DCp(x), the distribution of a pattern dependency, and the energy distribution “s”;
a deciding portion configured to decide radiation locations and a radiation shape of the energy beam based on data on a pattern
location and a pattern shape for each of the patterns in the sub-writing regions; and
a radiating portion configured to radiate the energy beam on the radiation location on the target with the radiation shape
for a period in which a radiated energy level from the energy beam reaches the radiation amount D(x).
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