| US 7,547,205 B2 | ||
| Microimprint/nanoimprint uniform pressing apparatus | ||
| Shou-Ren Chen, Hsinchu (Taiwan); Chuan-Feng Chen, Hsinchu (Taiwan); Yu-Lun Ho, Hsinchu (Taiwan); Jen-Hua Wu, Hsinchu (Taiwan); Wei-Han Wang, Hsinchu (Taiwan); and Lai-Sheng Chen, Hsinchu (Taiwan) | ||
| Assigned to Industrial Technology Research Institute, Hsinchu Hsien (Taiwan) | ||
| Filed on Jul. 07, 2005, as Appl. No. 11/175,341. | ||
| Claims priority of application No. 94113378 A (TW), filed on Apr. 27, 2005. | ||
| Prior Publication US 2006/0246169 A1, Nov. 02, 2006 | ||
| Int. Cl. B29C 43/02 (2006.01) | ||
| U.S. Cl. 425—174.4 [425/193; 425/384; 425/385] | 14 Claims |
| 1. A microimprint/nanoimpnnt uniform pressing apparatus for providing uniform imprinting pressure to a molding material layer
formed between a substrate and a mold, the microimprint/nanoimprint uniform pressing apparatus comprising:
a holding unit formed with an opening at one end thereof and an accommodating space therein;
a driving unit connected to the holding unit;
a uniform pressing unit being directly in contact with the substrate or the mold and comprising a fluid and a bag-shaped flexible
membrane;
a carrier unit for providing support for performing imprint molding; and
two transmission units provided at two sides of the carrier unit respectively, for transmitting the substrate in the form
of a continuous strip,
wherein the fluid fills in the accommodating space and the opening is sealed by the flexible membrane such that the fluid
is enclosed by the holding unit and the flexible membrane.
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