US 7,544,586 B2
Method of fabricating chips and an associated support
Bruno Ghyselen, Seyssinet-Pariset (France); and Olivier Rayssac, Grenoble (France)
Assigned to S.O.I. Tec Silicon on Insulator Technologies, Bernin (France)
Filed on May 23, 2005, as Appl. No. 11/136,252.
Prior Publication US 2005/0236700 A1, Oct. 27, 2005
Int. Cl. H01L 21/00 (2006.01)
U.S. Cl. 438—460  [438/462] 30 Claims
OG exemplary drawing
 
1. A method of fabricating a plurality of chips, each chip comprising at least one circuit, which method comprises the following steps in succession:
creating chips on a layer of semiconductor material that is integral with a substrate;
forming a weakening pattern corresponding to a predetermined cutting pattern on a support;
transferring a layer of semiconductor material that contains the chips from the substrate to the support; and
forming individual chips by cutting the chip-containing layer in accordance with the predetermined cutting pattern.