| US 7,542,548 B2 | ||
| X-ray optical system | ||
| Ryuji Matsuo, Kunitachi (Japan); Akira Echizenya, Fussa (Japan); and Go Fujinawa, Hamura (Japan) | ||
| Assigned to Rigaku Corp., Akishima-shi (Japan) | ||
| Filed on Oct. 10, 2007, as Appl. No. 11/973,825. | ||
| Claims priority of application No. 2006-276135 (JP), filed on Oct. 10, 2006. | ||
| Prior Publication US 2008/0084967 A1, Apr. 10, 2008 | ||
| Int. Cl. G21K 1/06 (2006.01) | ||
| U.S. Cl. 378—84 [378/44; 378/70] | 7 Claims |
| 1. An X-ray optical system comprising:
an X-ray source, which generates an X-ray beam having a linear section;
a diverging-beam path, in which the X-ray beam diverges with a predetermined divergence angle in a plane including both a
direction perpendicular to a longitudinal direction of a cross section of the X-ray beam and a traveling direction of the
X-ray beam, the plane being referred to as a specific plane hereinafter;
a parallel-beam path, in which the X-ray beam travels in parallel in the specific plane;
a parabolic multilayer mirror, which is arranged between the X-ray source and the parallel-beam path, and has a reflective
surface having a parabolic shape in the specific plane and a parabolic focal point located on the X-ray source, and reflects
the X-ray beam coming from the X-ray source at the reflective surface to generate a parallel beam;
an optical-path selection slit device, which allows any one of the diverging and parallel beams to pass through and interrupts
other of the diverging and parallel beams; and
a polycapillary optics, which is detachably inserted into the parallel-beam path at a position behind the optical-path selection
slit device, and receives the parallel beam and discharges a converging beam focused on a point.
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