recording a baseline dark field;

directing a light source toward a field of view to be examined;

receiving the field of view in a camera having a centerline, wherein the centerline is oriented toward a field of view, wherein the field of view encompasses at least a first portion of a first surface of the substrate, wherein the light source is directed toward the field of view to be examined at a first angle β relative to the first surface of the substrate, wherein the first angle β orients the light source to emit light impinging the first surface within the field of view, the light source is further oriented at a second angle δ relative to the centerline, the second angle δ being between about 90 degrees and less than about 180 degrees, the centerline intersects the first surface at a third angle α, the third angle α being between about 20 degrees and about 33 degrees, the first angle β is selected to minimize a direct reflection of light from the first portion of the first surface to the camera, wherein the light source and the camera are included in a process chamber for applying a manufacturing process to the substrate, the manufacturing process being in addition to an inspection process, wherein the light source includes a plurality of point light sources, wherein each one of the point light sources has a corresponding selected wavelength of light output and wherein the method further includes:

selecting one of the plurality of light sources having the selected wavelength of light output; and

selecting one of a plurality of intensity levels, wherein the selected wavelength of light output and the selected intensity level corresponds to the manufacturing process applied to the substrate;

comparing the received field of view to the baseline dark field;

detecting at least one of a droplet, a particle or a surface obstruction (DPO) within the received field; and

outputting a test result.