| US 7,541,636 B2 | ||
| Memory cell comprising one MOS transistor with an isolated body having a reinforced memory effect | ||
| Rossella Ranica, Grenoble (France); Alexandre Villaret, Grenoble (France); and Pascale Mazoyer, Domene (France) | ||
| Assigned to STMicroelectronics Crolles SAS, Crolles (France) | ||
| Filed on Jun. 30, 2006, as Appl. No. 11/479,421. | ||
| Claims priority of application No. 05 51836 (FR), filed on Jun. 30, 2005. | ||
| Prior Publication US 2007/0013030 A1, Jan. 18, 2007 | ||
| Int. Cl. H01L 29/78 (2006.01) | ||
| U.S. Cl. 257—314 [257/E29.019; 257/E29.025; 438/294] | 15 Claims |

| 1. A memory cell with one transistor on a floating body region isolated by its lower surface by a junction, in which said junction is non-planar, further comprising an isolating ring around the floating body region, the isolating ring having an upper portion with a first width and a lower portion with a second width that is less than the first width, wherein said junction exhibits a peripheral upward protrusion at a level of the lower portion of the isolating ring. |