| US 7,541,603 B2 | ||
| Radiation system and lithographic apparatus comprising the same | ||
| Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch (Netherlands); Vadim Yevgenyevich Banine, Helmond (Netherlands); Derk Jan Wilfred Klunder, Geldrop (Netherlands); Wouter Anthon Soer, Nijmegen (Netherlands); Johannes Christiaan Leonardus Franken, Knegsel (Netherlands); Olav Waldemar Vladimir Frijns, 's-Hertogenbosch (Netherlands); and Niels Machiel Driessen, Valkenswaard (Netherlands) | ||
| Assigned to ASML Netherlands B.V., Veldhoven (Netherlands) | ||
| Filed on Sep. 27, 2006, as Appl. No. 11/527,731. | ||
| Prior Publication US 2008/0074655 A1, Mar. 27, 2008 | ||
| Int. Cl. G21K 5/00 (2006.01) | ||
| U.S. Cl. 250—504R [101/450.1; 378/34] | 17 Claims |
| 1. An optical sensor apparatus for use in an extreme ultraviolet lithographic system comprising:
an optical sensor comprising a sensor surface; and
a removal mechanism configured to remove debris from the sensor surface wherein (i) the sensor surface comprises a surface
part of a rotatable plate and the removal mechanism is arranged to remove debris from another part of the plate or (ii) the
removal mechanism comprises a heating system configured to elevate a temperature of the sensor surface.
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