US 7,541,463 B2
Sulfur-containing naphthalimide derivatives
Xuhong Qian, Shanghai (China); Yonggang Li, Shanghai (China); Yufang Xu, Shanghai (China); Jian Ding, Shanghai (China); Liping Lin, Shanghai (China); Zehong Miao, Shanghai (China); Hong Zhu, Shanghai (China); and Baoyuan Qu, Shanghai (China)
Assigned to East China University of Science and Technology, Shanghai (China); Shanghai Institute of Materia Medica, Chinese Academy of Science, Shanghai (China); and Dalian University of Technology, Dalian (China)
Filed on Oct. 31, 2005, as Appl. No. 11/263,591.
Application 11/263591 is a continuation of application No. PCT/CN2004/000442, filed on Apr. 30, 2004.
Claims priority of application No. 03 1 16709 (CN), filed on Apr. 30, 2003.
Prior Publication US 2006/0111367 A1, May 25, 2006
Int. Cl. A61K 31/4365 (2006.01); C07D 221/18 (2006.01); C07D 471/06 (2006.01)
U.S. Cl. 546—58  [546/66; 546/67; 514/280; 514/285; 514/287] 4 Claims
 
1. A compound of formula (Ia):

OG Complex Work Unit Drawing
wherein R7 is C1-C6 alkyl, —(C1-C6 alkyl)—NH2, —(C1-C6 alkyl)N(C1-C6 alkyl)2, or —(C1-C6 alkyl) piperazine;
wherein X and Y are independently C or N;
wherein R9 is a phenyl, or a phenyl substituted by 1-3 substituents, wherein the substituents are C1-C6 alkyl, —NO2, —OH, C1-C6 alkoxy, or halo, or R9 taken together with X and Y form a benzene ring;
with the proviso that R9 is absent when X═Y═N; and provided R7 is not a C1-C6 alkyl when R9 taken together with X and Y form a benzene ring
or pharmaceutically acceptable salts thereof.