| US 7,541,134 B2 | ||
| Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | ||
| Motoaki Iwabuchi, Joetsu (Japan); Yoshitaka Hamada, Joetsu (Japan); Tsutomu Ogihara, Joetsu (Japan); Takeshi Asano, Joetsu (Japan); Takafumi Ueda, Joetsu (Japan); and Dirk Pfeiffer, New York, N.Y. (US) | ||
| Assigned to International Business Machines Corporation, Armonk, N.Y. (US); and Shin-Etsu Chemical Co., Ltd, Tokyo (Japan) | ||
| Filed on Jun. 10, 2005, as Appl. No. 11/150,565. | ||
| Claims priority of application No. 2004-172222 (JP), filed on Jun. 10, 2004. | ||
| Prior Publication US 2005/0277058 A1, Dec. 15, 2005 | ||
| Int. Cl. G03F 7/11 (2006.01); G03F 7/039 (2006.01); G03F 7/095 (2006.01) | ||
| U.S. Cl. 430—272.1 [528/41; 528/43; 438/952; 430/270.1] | 8 Claims |
| 1. An antireflective film-forming composition, comprising:
an organic solvent;
an acid generator; and
a polymer expressed by Formula (1) which is a copolymer polymerized using a basic catalyst of tetramethylammonium hydroxide,
comprising monomer units Ua, Ub and Uc:
 wherein R1a is a monovalent organic group capable of crosslinking selected from 3,4-epoxycyclohexyl-ethyl and hydroxyl-propyl; R2 is phenyl; R5 is a monovalent organic group incapable of crosslinking selected from 3-(2′-methoxypropoxy)propyl and 2,3-dimethoxypropoxypropyl;
p is a number in the range 0<p <1, q is a number in the range 0<q<1, wherein p+q<1.
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