US 7,540,912 B2
Hard films and sputtering targets for the deposition thereof
Kenji Yamamoto, Kobe (Japan); and German Fox-Rabinovich, Hamilton (Canada)
Assigned to Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe-shi (Japan)
Filed on Jul. 03, 2006, as Appl. No. 11/428,491.
Claims priority of application No. 2005-319863 (JP), filed on Nov. 02, 2005.
Prior Publication US 2007/0099028 A1, May 03, 2007
Int. Cl. B32B 9/00 (2006.01)
U.S. Cl. 106—287.17 4 Claims
 
1. A hard film comprising (Zr1-a, Hfa)(C1-xNx) and satisfying following Conditions (1) and (2):
   
  0.07 ≤ a ≤ 0.4 Condition (1)
  0 ≤ x ≤ 1 Condition (2)
   
wherein “a” and “x” are the atomic ratios of hafnium (Hf) and nitrogen (N), respectively and
wherein x is not equal to 1.