| US 7,538,890 B2 | ||
| Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof | ||
| Zongtao Ge, Saitama (Japan); Takayuki Saito, Saitama (Japan); and Minoru Kurose, Saitama (Japan) | ||
| Assigned to Fujinon Corporation, Saitama-Shi (Japan) | ||
| Filed on Jun. 06, 2005, as Appl. No. 11/144,709. | ||
| Claims priority of application No. 2004-168965 (JP), filed on Jun. 07, 2004; application No. 2004-168966 (JP), filed on Jun. 07, 2004; and application No. 2005-128344 (JP), filed on Apr. 26, 2005. | ||
| Prior Publication US 2005/0270543 A1, Dec. 08, 2005 | ||
| Int. Cl. G01B 11/02 (2006.01) | ||
| U.S. Cl. 356—512 | 13 Claims |

| 1. A wavefront-measuring interferometer apparatus comprising:
a semi-transmitting/reflecting surface that reflects part of a light beam to be measured back in the opposite direction to
the direction of incidence as a sample luminous flux;
a reference light producing device, which has a converging lens that converges a transmitted luminous flux transmitted through
said semi-transmitting/reflecting surface, and a minute reflection diffracting part disposed at the convergent point of said
converging lens, and converts part of said transmitted luminous flux incident thereon from said semi-transmitting/reflecting
surface into a wavefront-shaped reference luminous flux, and outputs said reference luminous flux toward said semi-transmitting/reflecting
surface; and
an image-forming part that has a detection surface, and leads, to said detection surface, interfering light obtained by combining
said reference luminous flux and said sample luminous flux, so as to form interference fringes on said detection surface;
wherein the wavefront-measuring interferometer apparatus is constituted to carry out wavefront measurement on said light beam
based on said interference fringes formed on said detection surface.
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