| US 7,538,854 B2 | ||
| Measuring apparatus and exposure apparatus having the same | ||
| Yumiko Ohsaki, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Feb. 16, 2006, as Appl. No. 11/276,164. | ||
| Claims priority of application No. 2005-040271 (JP), filed on Feb. 17, 2005. | ||
| Prior Publication US 2006/0187435 A1, Aug. 24, 2006 | ||
| Int. Cl. G03B 27/52 (2006.01); G03B 27/72 (2006.01) | ||
| U.S. Cl. 355—55 [355/71] | 9 Claims |
| 1. A measuring apparatus for measuring an optical performance of an optical system to be measured, said measuring apparatus
comprising:
an optical element for decreasing the numerical aperture of a light that has been emitted from the optical system to be measured
by transmitting and refracting or diffracting the light that has been emitted from the optical system to be measured;
a substrate that includes at least one of a pinhole, a slit, and a window that selects a wave front of the light from the
optical element, and a grating that divides a wave front of the light from the optical element; and
a detector for detecting interference fringes formed by the light that has passed through the substrate.
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