| US 7,538,852 B2 | ||
| Exposure apparatus and device manufacturing method | ||
| Takahito Chibana, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Mar. 21, 2007, as Appl. No. 11/688,955. | ||
| Application 11/688955 is a division of application No. 10/988514, filed on Nov. 16, 2004, granted, now 7,218,377. | ||
| Claims priority of application No. 2003-388198 (JP), filed on Nov. 18, 2003. | ||
| Prior Publication US 2007/0159608 A1, Jul. 12, 2007 | ||
| Int. Cl. G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03B 27/54 (2006.01); G21K 5/00 (2006.01) | ||
| U.S. Cl. 355—30 [355/53; 355/67; 378/34] | 5 Claims |
| 1. An exposure apparatus for exposing a substrate to an image of a pattern of an original, the apparatus comprising:
a projection optical system configured to project the image onto the substrate;
a stage configured to hold the substrate;
a cover configured to substantially surround an exposure light path between an end portion of the projection optical system
and the stage, the end portion facing the stage;
a supply port provided inside the cover, via which a purge gas is supplied into a space surrounded by the cover; and
a first exhaust port provided in an end portion of the cover, via which the gas is exhausted from the space, the end portion
of the cover facing the stage.
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