| US 7,538,333 B1 | ||
| Contactless charge measurement of product wafers and control of corona generation and deposition | ||
| Amin Samsavar, Saratoga, Calif. (US); John M. Schmidt, Oakland, Calif. (US); Rainer Schierle, Los Altos, Calif. (US); Gregory S. Horner, Santa Clara, Calif. (US); Thomas G. Miller, Sunnyvale, Calif. (US); Zhiwei Xu, Sunnyvale, Calif. (US); Xiaofeng Hu, Richardson, Tex. (US); Jianou Shi, Milpitas, Calif. (US); and Sergio Edelstein, Los Gatos, Calif. (US) | ||
| Assigned to KLA-Tencor Technologies Corporation, Milpitas, Calif. (US) | ||
| Filed on Jul. 27, 2006, as Appl. No. 11/460,517. | ||
| Application 11/460517 is a division of application No. 10/701112, filed on Nov. 04, 2003, granted, now 7,248,062. | ||
| Claims priority of provisional application 60/423639, filed on Nov. 04, 2002. | ||
| Int. Cl. H01J 37/30 (2006.01); H01J 37/317 (2006.01); G01R 31/26 (2006.01) | ||
| U.S. Cl. 250—492.21 [250/492.22; 250/492.2; 250/492.3; 250/492.1; 324/501] | 18 Claims |

| 1. A system, comprising:
a corona source configured to deposit a charge onto a specimen; and
an environmental control unit configured to alter a property of the environment within the corona source; and a gas flow device
coupled to the corona source, wherein the gas flow device is configured to alter a flow of one or more gases within the corona
source.
|