| US 7,537,882 B2 | ||
| Anti-reflective coating composition and production method for pattern using the same | ||
| Jirou Matsuo, Chiba (Japan); Kiyofumi Takano, Chiba (Japan); Yusuke Takano, Kakegawa (Japan); and Yasushi Akiyama, Kakegawa (Japan) | ||
| Assigned to Dainippon Ink and Chemicals, Inc., Tokyo (Japan); and AZ Electronic Materials (Japan) K.K., Tokyo (Japan) | ||
| Appl. No. 11/630,411 PCT Filed Jun. 29, 2005, PCT No. PCT/JP2005/012001 § 371(c)(1), (2), (4) Date Dec. 21, 2006, PCT Pub. No. WO2006/003958, PCT Pub. Date Jan. 12, 2006. |
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| Claims priority of application No. 2004-194423 (JP), filed on Jun. 30, 2004. | ||
| Prior Publication US 2007/0238048 A1, Oct. 11, 2007 | ||
| Int. Cl. G03F 7/11 (2006.01); H01L 21/027 (2006.01) | ||
| U.S. Cl. 430—273.1 [523/300; 524/131; 524/144; 438/952] | 7 Claims |
| 1. An anti-reflective coating composition comprising at least the following components (A), (B), (C), (D), and (E):
(A) perfluoroalkyl•alkylenesulfonic acid represented by the following formula (1):
CnF2n+1(CH2CH2)mSO3H (1)
(wherein, n represents an integer from 1 to 20, and m represents an integer from 0 to 20);
(B) organic amine;
(C) water-soluble polymer;
(D) perfluoroalkylethyl group containing compound represented by the following formula (2):
CkF2k+1CH2CH2—X—Y (2)
(wherein, k represents an integer from 1 to 20, x represents —O—CH2CH2—, —S—CH2CH2—, —O—CH2CH(CH3)—, or —S—CH2CH(CH3)—, y represents a carboxyl group, sulfonic acid group, or phosphoric acid group); and
(E) water.
|