US 7,537,810 B2
Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel
Shinji Hayashi, Tokyo (Japan); Shunsuke Sega, Tokyo (Japan); Hiromu Taguchi, Nagoya (Japan); and Mitsutaka Hasegawa, Nagoya (Japan)
Assigned to Dai Nippon Printing Co., Ltd., Tokyo-to (Japan)
Appl. No. 10/550,577
PCT Filed Mar. 24, 2004, PCT No. PCT/JP2004/004001
§ 371(c)(1), (2), (4) Date Sep. 22, 2005,
PCT Pub. No. WO2004/086145, PCT Pub. Date Oct. 07, 2004.
Claims priority of application No. 2003-080943 (JP), filed on Mar. 24, 2003; application No. 2003-080961 (JP), filed on Mar. 24, 2003; application No. 2003-080977 (JP), filed on Mar. 24, 2003; and application No. 2003-080991 (JP), filed on Mar. 24, 2003.
Prior Publication US 2006/0229376 A1, Oct. 12, 2006
This patent is subject to a terminal disclaimer.
Int. Cl. C09K 19/00 (2006.01); C09K 19/38 (2006.01); G02F 1/13 (2006.01); G03C 1/00 (2006.01); G03F 7/00 (2006.01)
U.S. Cl. 428—1.1  [428/1.3; 428/1.5; 428/1.6; 430/7; 430/20; 430/281.1; 430/286.1; 522/39; 522/121; 522/123] 33 Claims
OG exemplary drawing
 
1. A curable resin composition for forming a photosensitive pattern comprising:
a copolymer (a) having a polymer chain including at least a repeating unit having an acidic functional group and a repeating unit including a photocurable functional group;
a photopolymerization initiator (b) having a tertiary amine structure; and
a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups wherein the photocurable functional groups are photoradical polymerizing functional groups;
wherein the curable resin composition may contain a photocurable compound (d) having at least two photocurable functional groups with the proviso that the photocurable compound (d) is other than the photocurable compound (c);
wherein the copolymer (a) is an imide group containing polymer (a1) containing a constitutional unit including a cyclic imide group represented by a following formula (19), as the constitutional unit including the photocurable functional group:

OG Complex Work Unit Drawing
wherein each of R8 and R9 is an alkyl group having 4 or less carbon atoms independently, or one of R8 and R9 is a hydrogen atom and the other is an alkyl group having 4 or less carbon atoms, or both R8 and R9 together form a carbon ring;
wherein a content of conolymer (a1) is in the range of 5 to 40% by weight, on the basis of solid content; and
wherein a solid content weight ratio ((a1)/(c)) of the imide group containing copolymer (a1) to the photocurable compound (c) in a case that the curable resin composition includes no photocurable compound (d) with the proviso that the photocurable compound (d) is other than the photocurable compound (c), or a solid content weight ratio ((a1)/{(c)+(d)}) of the imide group containing copolymer (a1) to a total of the photocurable compound (c) and the photocurable compound (d) in a case that the curable resin composition includes the photocurable compound (d), is 0.7 or less.