| US 7,537,673 B2 | ||
| Plasma processing apparatus | ||
| Young Jong Lee, Sungnam-shi (Korea, Republic of); Jun Young Choi, Seoul (Korea, Republic of); Hyun Hwan Ahn, Sungnam-shi (Korea, Republic of); Chan-Ho Kang, Yongin-shi (Korea, Republic of); Hyun-Woo Baek, Sungnam-shi (Korea, Republic of); and Young-Joo Hwang, Seoul (Korea, Republic of) | ||
| Assigned to Advanced Display Processing Engineering Co., Ltd., Sungnam-Shi (Korea, Republic of) | ||
| Filed on Sep. 06, 2005, as Appl. No. 11/219,956. | ||
| Claims priority of application No. 10-2004-0071721 (KR), filed on Sep. 08, 2004. | ||
| Prior Publication US 2006/0048709 A1, Mar. 09, 2006 | ||
| Int. Cl. H01L 21/3065 (2006.01); C23C 16/00 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01) | ||
| U.S. Cl. 156—345.54 [156/345.29; 156/345.31; 156/345.32; 156/345.52; 118/715; 118/719; 118/728; 118/729] | 3 Claims |
| 1. A plasma processing apparatus for performing a predetermined process on a substrate using plasma, comprising:
a chamber;
a substrate mounting table equipped within the chamber to place the substrate thereon;
an outer lifting bar provided at an outer side of the substrate mounting table to move up and down, and serving to temporarily
support the substrate above the substrate mounting table,
a baffle provided to shield a space formed between the substrate mounting table and a side wall of the chamber, and having
a plurality of through holes formed on a predetermined portion of the baffle,
the outer lifting bar comprising,
a driving shaft moving up and down,
a substrate supporting member coupled perpendicular to an upper end of the driving shaft the substrate supporting member being
disposed above the substrate mounting table by pivoting the substrate supporting member about the driving shaft to a position
above the substrate mounting table,
shielding portion coupled to a side wall of the substrate mounting table, the shielding portion being opened at an upper surface
to allow the substrate supporting member to move through the upper surface and be received in the shield portion,
wherein the baffle and the substrate supporting member are driven vertically at the same time by the driving shaft.
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