| US 7,531,797 B2 | ||
| Probe-holding apparatus, sample-obtaining apparatus, sample-processing apparatus, sample-processing method and sample-evaluating method | ||
| Taiko Motoi, Atsugi (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Feb. 12, 2008, as Appl. No. 12/29,766. | ||
| Application 12/029766 is a continuation of application No. 10/541551, filed on Jul. 06, 2005, granted, now 7,385,206. | ||
| Prior Publication US 2008/0135752 A1, Jun. 12, 2008 | ||
| Int. Cl. H01J 37/08 (2006.01) | ||
| U.S. Cl. 250—309 [250/492.21; 250/442.11; 250/443.1; 250/306] | 9 Claims |
| 1. A sample processing apparatus comprising:
a stage for supporting a sample;
first temperature control means for controlling a temperature of said sample;
ion beam generation means for irradiating said sample with an ion beam;
detection means for detecting a signal emitted from said sample in response to the irradiation of said ion beam;
a probe for obtaining a part of the sample processed by the irradiation of said ion beam and conveying it to a sample table;
second temperature control means for controlling a temperature of said probe; and
third temperature control means for controlling a temperature of said sample table.
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