| US 7,531,289 B2 | ||
| Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | ||
| Takeshi Kinsho, Joetsu (Japan); Takeru Watanabe, Joetsu (Japan); Masaki Ohashi, Joetsu (Japan); Koji Hasegawa, Joetsu (Japan); and Seiichiro Tachibana, Joetsu (Japan) | ||
| Assigned to Shin-Etsu Chemical Co., Ltd., Tokyo (Japan) | ||
| Filed on Oct. 27, 2005, as Appl. No. 11/258,894. | ||
| Claims priority of application No. 2004-313762 (JP), filed on Oct. 28, 2004. | ||
| Prior Publication US 2006/0093960 A1, May 04, 2006 | ||
| This patent is subject to a terminal disclaimer. | ||
| Int. Cl. G03F 7/039 (2006.01); C08F 18/20 (2006.01); C07D 315/00 (2006.01) | ||
| U.S. Cl. 430—270.1 [549/416; 549/417; 549/504; 526/246; 430/326] | 13 Claims |
1. A fluorinated monomer having a cyclic structure represented by the general formula (1):
 wherein Z is a divalent organic group containing a polymerizable unsaturated group, and the ring represented by
 |