	US 7,531,286 B2
	Radiation-sensitive resin composition
Yukio Nishimura, Mie (Japan); Hiroyuki Ishii, Mie (Japan); Masafumi Yamamoto, Mie (Japan); and Isao Nishimura, Mie (Japan)
Assigned to JSR Corporation, Tokyo (Japan)
Filed on Mar. 13, 2003, as Appl. No. 10/386,707.
Claims priority of application No. 2002-071696 (JP), filed on Mar. 15, 2002.
Prior Publication US 2003/0203309 A1, Oct. 30, 2003
This patent is subject to a terminal disclaimer.
Int. Cl. G03C 1/73 (2006.01); G03F 7/039 (2006.01)

U.S. Cl. 430—270.1 [430/910; 430/907; 430/922; 430/925; 430/326]

10 Claims

1. A radiation-sensitive resin composition comprising:

(A) a resin insoluble or scarcely soluble in alkali but which becomes alkali soluble by the action of an acid, comprising:

a recurring unit (1-1) shown in the following formula (1),

wherein

R ¹represents a hydrogen atom or a methyl group;

A ¹represents a single bond or a group -X¹-COO- wherein X¹represents a methylene group, a linear or branched alkylene group having 10 or less carbon atoms, or a bridged or non-bridged divalent alicyclic hydrocarbon group having 10 or less carbon atoms;

each R²individually represents a linear or branched alkyl group having 1-6 carbon atoms;

R³represents a hydrogen atom, a linear or branched alkyl group having 1-6 carbon atoms, or a linear or branched oxygen-containing organic group having 1-6 carbon atoms;

n is 0 or 1; and

at least one recurring unit having a lactone skeleton selected from the group consisting of a recurring unit (2-2) and a recurring unit (2-3) shown in the following formula (2),

wherein:

R⁸represents a hydrogen atom or a methyl group;

B is a methylene group, an oxygen atom, or a sulfur atom;

R⁹represents a hydrogen atom, a linear or branched alkyl group having 1-6 carbon atoms, or a linear or branched oxygen-containing organic group having 1-6 carbon atoms;

R¹⁰represents a hydrogen atom or a methyl group; and

R¹¹represents a hydrogen atom, a linear or branched alkyl group having 1-6 carbon atoms, or a linear or branched oxygen-containing organic group having 1-6 carbon atoms, and

(B) 1-(4-n-butoxynaphthalen-1-yl)tetrahydrothiophenium nonafluoro-n-butanesulfonate as a photoacid generator;

wherein the resin (A) further comprises a recurring unit of the following formula (3):

wherein R¹²represents a hydrogen atom or a methyl group, Y indicates a hydrocarbon group with a valence m having 12 or less carbon atoms that may be substituted with fluorine atoms, D represents a polar group having a valence (m-1), and m is 2 or 3.