US 7,528,205 B2
Photo radical generator, photo sensitive resin composition and article
Katsuya Sakayori, Tokyo (Japan)
Assigned to Dai Nippon Printing Co., Ltd., Tokyo-to (Japan)
Filed on Sep. 21, 2004, as Appl. No. 10/945,697.
Claims priority of application No. 2003-336436 (JP), filed on Sep. 26, 2003; and application No. 2004-101325 (JP), filed on Mar. 30, 2004.
Prior Publication US 2005/0119432 A1, Jun. 02, 2005
Int. Cl. C08F 2/48 (2006.01); C08F 2/46 (2006.01)
U.S. Cl. 526—348  [526/217; 528/322; 528/228; 430/326] 11 Claims
 
1. A photoradical generator comprising a compound (a) having a seven-membered ring imide structure-containing group represented by the following formula (2):

OG Complex Work Unit Drawing
wherein, R1, R2, R3, R4, R5, R6, R7 and R8 respectively represent a hydrogen atom or a substituent and may be a cyclic structure in which they are bonded to each other; “X” represents a monovalent chemical structure having a part of a non-aromatic skeleton containing a hydrocarbon skeleton directly bonded to “N” of the seven-membered ring imide structure-containing group and a part containing a hydrogen-donating atom; when groups selected from the group consisting of R1, R2, R3, R4, R5, R6, R7 and R8 are bonded to each other to have a cyclic structure, the cyclic structure is a structure that can keep a twist of two aromatic rings contained in a biphenyl structure contained in said formula.