| US 7,527,919 B2 | ||
| Production device and production method for an optical device component having a grating structure | ||
| Akira Sakamoto, Sakura (Japan); and Satoshi Okude, Sakura (Japan) | ||
| Assigned to Fujikura Ltd., Tokyo (Japan) | ||
| Filed on Aug. 05, 2004, as Appl. No. 10/911,581. | ||
| Claims priority of application No. P2003-206061 (JP), filed on Aug. 05, 2003. | ||
| Prior Publication US 2005/0031981 A1, Feb. 10, 2005 | ||
| Int. Cl. G02B 6/13 (2006.01); G02B 6/122 (2006.01) | ||
| U.S. Cl. 430—321 [430/290] | 14 Claims |
| 1. A production method for an optical component having a grating structure, comprising the steps of:
radiating non-interfering monochromatic light of an ultraviolet wavelength region onto a silica-based optical waveguide diffused
with at least one of hydrogen and deuterium so as to change a refractive index of said silica-based optical waveguide; and
radiating interfering light onto said silica-based optical waveguide,
wherein said non-interfering monochromatic light is incoherent light.
|