| US 7,525,669 B1 | ||
| High-speed, scanning phase-shifting profilometry using 2D CMOS sensor | ||
| Mohsen Abdollahi, 9008 Cannstatt Dr., Huntsville, Ala. 35802 (US) | ||
| Filed on Jul. 09, 2004, as Appl. No. 10/887,673. | ||
| Int. Cl. G01B 11/24 (2006.01) | ||
| U.S. Cl. 356—603 | 17 Claims |
| 1. A method comprising:
providing a first sinusoidal wavelength source of illumination obliquely projected and focused onto said workpiece,
developing relative movement between said first sinusoidal wavelength and said workpiece,
focusing light reflected from a workpiece onto a single 2-dimensional sensor having individually addressable rows of pixels,
collecting phase shifted data from said workpiece at selected increments of said first sinusoidal wavelength while said sinusoidal
wavelength moves with respect to said workpiece, said collecting phase shifted data comprising collecting said phase shifted
data from only selected ones of said individually addressable rows of pixels of a single 2-dimensional sensor,
processing said phase shifted data collected from said only selected ones of said individually addressable rows of pixels
to produce a 3-dimensional image of said workpiece.
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