| US 7,525,656 B2 | ||
| Exposure apparatus and device fabrication method | ||
| Ayako Kadono, Utsunomiya (Japan); and Haruna Kawashima, Haga-gun (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Aug. 10, 2006, as Appl. No. 11/463,657. | ||
| Claims priority of application No. 2005-242033 (JP), filed on Aug. 24, 2005. | ||
| Prior Publication US 2007/0046922 A1, Mar. 01, 2007 | ||
| Int. Cl. G01J 4/00 (2006.01) | ||
| U.S. Cl. 356—364 | 13 Claims |
| 1. An exposure apparatus comprising:
a reticle stage for supporting a reticle;
an illumination optical system for illuminating the reticle;
a projection optical system for projecting an image of a pattern of the reticle onto a substrate;
a polarization state measuring part for measuring a polarization state; and
an optical unit, supported by the reticle stage exchangeable for the reticle, for introducing a light from the illumination
optical system to the polarization state measuring part,
wherein said polarization state measuring part includes:
a phase shifter;
a polarization element; and
a light detector for detecting the light from the illumination optical system via the phase shifter and the polarization element.
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