| US 7,525,640 B2 | ||
| Lithographic apparatus and device manufacturing method | ||
| Bastiaan Stephanus Hendricus Jansen, Waalre (Netherlands); Erik Roelof Loopstra, Heeze (Netherlands); Marius Ravensbergen, Bergeijk (Netherlands); and Markus Josef Hauf, Ichenhausen (Germany) | ||
| Assigned to ASML Netherlands B.V., Veldhoven (Netherlands); and Carl Zeiss SMT AG, Oberkochen (Germany) | ||
| Filed on Nov. 07, 2006, as Appl. No. 11/593,648. | ||
| Prior Publication US 2008/0123066 A1, May 29, 2008 | ||
| Int. Cl. G03B 27/54 (2006.01) | ||
| U.S. Cl. 355—67 [355/71; 378/34] | 23 Claims |
| 19. A device manufacturing method comprising:
imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
projecting the patterned radiation beam onto a target portion of a substrate using a projection system;
locally changing an optical path length of the radiation beam using an array of optical elements arranged transverse to the
radiation beam, each optical element comprising an individually addressable electrical heating device; and
controlling the heating devices depending on a phase map in a pupil plane of the projection system.
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