| US 7,525,639 B2 | ||
| Exposure apparatus and method, and device manufacturing method using the same | ||
| Akihiro Yamada, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Dec. 15, 2005, as Appl. No. 11/305,484. | ||
| Claims priority of application No. 2004-362668 (JP), filed on Dec. 15, 2004. | ||
| Prior Publication US 2006/0152700 A1, Jul. 13, 2006 | ||
| Int. Cl. G03B 27/52 (2006.01); G03B 27/54 (2006.01) | ||
| U.S. Cl. 355—55 [355/67] | 8 Claims |
| 1. An exposure apparatus for exposing a pattern of a reticle onto a plate, said exposure apparatus comprising:
a projection optical system for projecting the pattern onto the plate;
a switch for switching a polarization of a light for illuminating the reticle from a first polarization state to a second
polarization state different from the first polarization state; and
an adjuster for adjusting an aberration of said projection optical system when said switch switches the polarization of the
light from the first polarization state to the second polarization state,
wherein said adjuster adjusts an aberration of only a specific part that a diffraction light from the reticle passes through
on a pupil plane in said projection optical system.
|