US 7,525,634 B2
Monitoring apparatus and method particularly useful in photolithographically
Giora Dishon, Jerusalem (Israel); Moshe Finarov, Rehovot (Israel); Zvi Nirel, Mevaseret Zion (Israel); and Yoel Cohen, Nes Ziona (Israel)
Assigned to Nova Measuring Instruments Ltd., Rehovot (Israel)
Filed on Oct. 25, 2007, as Appl. No. 11/924,365.
Application 11/924365 is a continuation of application No. 11/402009, filed on Apr. 12, 2006, granted, now 7,289,190.
Application 11/402009 is a continuation of application No. 10/763383, filed on Jan. 26, 2004, granted, now 7,030,957.
Application 10/763383 is a continuation of application No. 09/730919, filed on Dec. 06, 2000, granted, now 6,842,220.
Application 09/730919 is a continuation of application No. 09/184727, filed on Nov. 02, 1998, granted, now 6,166,801.
Claims priority of application No. 125337 (IL), filed on Jul. 14, 1998.
Prior Publication US 2008/0043229 A1, Feb. 21, 2008
This patent is subject to a terminal disclaimer.
Int. Cl. G03B 27/32 (2006.01); G03D 5/00 (2006.01); G01B 11/00 (2006.01); G01N 21/00 (2006.01)
U.S. Cl. 355—27  [396/578; 396/611; 356/237.2; 356/237.3; 356/237.4; 356/237.5] 26 Claims
OG exemplary drawing
 
1. A system configured to determine at least two properties of a substrate, comprising: a supporting plate configured to support the substrate; a measurement device coupled to the supporting plate, comprising: an illumination system configured to direct light toward a surface of the substrate; and a detection system coupled to the illumination system and configured to detect light propagating from the surface of the substrate, wherein the measurement device is configured to generate one or more output signals responsive to the detected light; and a control unit coupled to the measurement device and configured to determine a first property and a second property of the substrate from the one or more output signals, wherein the first property comprises a presence of coarse defects on the substrate, and wherein the second property comprises a presence of micro defects on the substrate.