| US 7,524,908 B2 | ||
| Copolymerized high polymer film and method of manufacturing the same | ||
| Jun Kawahara, Tokyo (Japan); Keizo Kinoshita, Tokyo (Japan); Nobutaka Kunimi, Ibaraki (Japan); and Akinori Nakano, Tokyo (Japan) | ||
| Assigned to NEC Corporation, Tokyo (Japan) | ||
| Filed on May 27, 2005, as Appl. No. 11/140,185. | ||
| Claims priority of application No. 2004-159796 (JP), filed on May 28, 2004. | ||
| Prior Publication US 2005/0282987 A1, Dec. 22, 2005 | ||
| Int. Cl. C08F 30/08 (2006.01) | ||
| U.S. Cl. 526—279 [526/285; 526/308; 526/335] | 10 Claims |
1. A copolymerized high polymer film manufactured by a vapor phase growth method, said copolymerized high polymer film comprising,
as skeleton, a first organic monomer and a second organic monomer, the first organic monomer having plural isopropenyl groups,
while the second organic monomer has an acetylene bond, wherein the first organic monomer comprises diisopropenyl benzenes,
said diisopropenyl benzenes being indicated as the following Formula (I) and having a first polymerization reactive site,
said first polymerization reactive site being an isopropenyl group
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