| US 7,524,609 B2 | ||
| Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition | ||
| Kenji Wada, Haibara-gun (Japan) | ||
| Assigned to FUJIFILM Corporation, Tokyo (Japan) | ||
| Filed on Mar. 09, 2007, as Appl. No. 11/716,054. | ||
| Claims priority of application No. 2006-064608 (JP), filed on Mar. 09, 2006. | ||
| Prior Publication US 2007/0212645 A1, Sep. 13, 2007 | ||
| Int. Cl. G03F 7/004 (2006.01); G03F 7/30 (2006.01); C07C 69/62 (2006.01); C07C 309/29 (2006.01) | ||
| U.S. Cl. 430—270.1 [430/326; 430/920; 430/921; 560/150; 562/30; 562/111; 562/113] | 11 Claims |
| 1. A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula
(I) upon irradiation with actinic ray or radiation:
Z—A—X—B—R—(Y)n (I)
wherein Z represents an organic acid group;
A represents a divalent linking group;
X represents a divalent linking group having a hetero atom;
B represents an oxygen atom or —N(Rx)—;
Rx represents a hydrogen atom or a monovalent organic group;
R represents a monovalent organic group substituted with Y, and when B represents —N(Rx)—, R and Rx may be bonded to each other to form a cyclic structure;
Y represents —COOH or —CHO, and when a plurality of Y's are present, the plurality of Y's may be the same or different; and
n represents an integer of from 1 to 3.
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