| US 7,523,702 B2 | ||
| Method and system for controlling thermal head and stencil material roll | ||
| Kenji Oshima, Ami-machi (Japan); Takashi Isozaki, Ami-machi (Japan); and Morio Ohashi, Ami-machi (Japan) | ||
| Assigned to Riso Kagaku Corporation, Tokyo (Japan) | ||
| Appl. No. 10/541,718 PCT Filed Dec. 04, 2003, PCT No. PCT/JP03/15551 § 371(c)(1), (2), (4) Date Sep. 28, 2005, PCT Pub. No. WO2004/062914, PCT Pub. Date Jul. 29, 2004. |
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| Claims priority of application No. 2003-004310 (JP), filed on Jan. 10, 2003. | ||
| Prior Publication US 2006/0107851 A1, May 25, 2006 | ||
| Int. Cl. B41C 1/14 (2006.01) | ||
| U.S. Cl. 101—128.4 [400/120.11; 400/120.12] | 6 Claims |
| 1. A thermal head control system for controlling heating energy to a thermal head perforating stencil material unrolled from
a stencil material roll comprising:
a residue obtaining means for obtaining an amount of stencil material remaining in the stencil material roll; and
a thermal head controlling means for controlling the heating energy to the thermal head on the basis of the amount of remaining
stencil material obtained by the residue obtaining means, such that the heating energy of the thermal head increases as the
amount of remaining stencil material decreases.
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