	US 7,522,254 B2
	Liquid crystal display device and method of fabricating the same
Hironori Kikkawa, Tokyo (Japan); Michiaki Sakamoto, Tokyo (Japan); Yuichi Yamaguchi, Tokyo (Japan); Hidenori Ikeno, Tokyo (Japan); and Fumihiko Matsuno, Tokyo (Japan)
Assigned to NEC LCD Technologies, Kanagawa (Japan)
Filed on Jul. 12, 2005, as Appl. No. 11/178,463.
Application 11/178463 is a division of application No. 10/059183, filed on Jan. 31, 2002, granted, now 6,937,302.
Claims priority of application No. 2001-024237 (JP), filed on Jan. 31, 2001.
Prior Publication US 2005/0243249 A1, Nov. 03, 2005
Int. Cl. G02F 1/1335 (2006.01)

U.S. Cl. 349—187 [349/113]

8 Claims

1. A method of fabricating a liquid crystal display device, comprising the steps at least of:

(a) randomly patterning a first electrically insulating film on a first substrate on which a switching device is fabricated;

(b) covering said first electrically insulating film with a second electrically insulating film; and

(c) forming a reflection electrode on a wavy surface of said first and second electrically insulating films such that said reflection electrode is electrically connected to an electrode of said switching device, said reflection electrode reflecting a light passing through both a second substrate facing and spaced away from said first substrate and a liquid crystal layer sandwiched between said first and second substrates,

said step (b) including the substeps of:

(b1) forming said second electrically insulating film over said first substrate such that said first electrically insulating film is entirely covered with said second electrically insulating film; and

(b2) partially removing said second electrically insulating film such that said second electrically insulating film extends outwardly from said first electrically insulating film by a certain length at an end of a display region in which images are to be displayed, thereby a step formed by said first and second electrically insulating films in the vicinity of said end of said display region is smoothed, and

said step (c) including the substeps of:

(c1) depositing a material of which said reflection electrode is composed, entirely over said second electrically insulating film;

(c2) coating a resist over said material;

(c3) removing said resist in an area in which said material is to be removed; and

(c4) etching said material with said resist being used as a mask, such that no residual portion of the reflection electrode material remains on said second electrically insulating film in the region outward of the display region that is smoothed.