US 7,520,795 B2
Grooved retaining ring
Shi-Ping Wang, Fremont, Calif. (US); Alain Duboust, Sunnyvale, Calif. (US); Antoine P. Manens, Santa Clara, Calif. (US); Wei-Yung Hsu, Santa Clara, Calif. (US); Jose Salas-Vernis, Santa Clara, Calif. (US); and Zhihong Wang, Santa Clara, Calif. (US)
Assigned to Applied Materials, Inc., Santa Clara, Calif. (US)
Filed on Aug. 29, 2006, as Appl. No. 11/468,267.
Claims priority of provisional application 60/713103, filed on Aug. 30, 2005.
Prior Publication US 2007/0044913 A1, Mar. 01, 2007
Int. Cl. B24B 1/00 (2006.01); B24B 41/06 (2006.01)
U.S. Cl. 451—36  [451/288; 451/398] 15 Claims
OG exemplary drawing
 
1. A retaining ring for chemical mechanical polishing, comprising:
a substantially annular ring having a bottom surface, the bottom surface including a plurality of pairs of adjacent channels, each of the channels extending from an inner diameter of the annular ring to an outer diameter of the annular ring, wherein a first channel of each of the pairs of adjacent channels is at a first angle to a radial segment of the retaining ring that intersects the first channel and a second channel of each of the pairs of adjacent channels is at a second angle to the radial segment of the retaining ring that intersects the second of the channels, the first angle being different from the second angle, the first channel not intersecting the second channel, the first channel being closer to the second channel than to any other channel, and the channels being straight.