| US 7,520,613 B2 | ||
| Wavefront aberration compensating apparatus and ophthalmologic unit having the same | ||
| Noriko Saito, Tokyo (Japan); Akio Kobayashi, Tokyo (Japan); and Hiroyuki Kawashima, Tokyo (Japan) | ||
| Assigned to Kabushiki Kaisha TOPCON, Tokyo (Japan) | ||
| Filed on Mar. 13, 2008, as Appl. No. 12/47,946. | ||
| Claims priority of application No. 2007-065524 (JP), filed on Mar. 14, 2007. | ||
| Prior Publication US 2008/0225228 A1, Sep. 18, 2008 | ||
| Int. Cl. A61B 3/10 (2006.01); A61B 3/14 (2006.01) | ||
| U.S. Cl. 351—205 [351/206] | 15 Claims |
| 1. A wavefront aberration compensating apparatus, comprising:
a deformable mirror which compensates a wavefront aberration of a light flux entered, the deformable mirror including a plurality
of electrodes, and a thin-film mirror which changes a configuration thereof in accordance with a voltage value applied to
each of the electrodes;
an optical system provided with the deformable mirror, and including an object subjected to aberration compensation;
a wavefront sensor which receives the light flux traveled through the object and the deformable mirror, and which measures
the wavefront aberration of the light flux;
a memory which stores therein a voltage template provided for each expansion mode according to a polynomial of wavefront aberration,
as a voltage alignment data for the electrodes which induces the corresponding expansion mode of the expansion modes; and
a controller configured to determine a superposition amplitude value of each of the expansion modes and calculate the voltage
value applied to each of the electrodes by using the voltage templates stored in the memory, such that the wavefront aberration
obtained by the wavefront sensor becomes a desired aberration, and to repeat compensation of the configuration of the thin-film
mirror of the deformable mirror on the basis of the calculated voltage value, such that the wavefront aberration of the light
flux measured by the wavefront sensor is suppressed.
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