| US 7,518,132 B2 | ||
| Light source apparatus, exposure apparatus and device fabrication method | ||
| Hajime Kanazawa, Utsunomiya (Japan); Yutaka Watanabe, Shioya-gun (Japan); Jun Ito, Utsunomiya (Japan); and Kazuki Fujimoto, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Jul. 07, 2006, as Appl. No. 11/456,104. | ||
| Claims priority of application No. 2005-200764 (JP), filed on Jul. 08, 2005. | ||
| Prior Publication US 2007/0023709 A1, Feb. 01, 2007 | ||
| Int. Cl. H01J 35/20 (2006.01) | ||
| U.S. Cl. 250—504R [250/492.2] | 11 Claims |
| 1. A light source apparatus for generating a plasma and supplying a light irradiated from the plasma to an optical system,
said light source apparatus comprising:
a first supply pipe for supplying a plasma generating gas to generate the plasma; and
a first gas filter, provided to the first supply pipe, for reducing a density of a hydrocarbon compound in the plasma generating
gas
wherein said first supply pipe consists of metal at least between the first filter and a supply port that supplies the plasma
generating gas.
|