| US 7,518,121 B2 | ||
| Method for determining lens errors in a particle-optical device | ||
| Diederik Jan Maas, Breda (Netherlands); Sjoerd Antonius Maria Mentink, Eindhoven (Netherlands); Jeroen Jan Lambertus Horikx, Eindhoven (Netherlands); and Bert Henning Freitag, Eindhoven (Netherlands) | ||
| Assigned to Fei Company, Hillsboro, Oreg. (US) | ||
| Filed on Aug. 30, 2006, as Appl. No. 11/512,806. | ||
| Claims priority of application No. 1029847 (NL), filed on Sep. 01, 2005. | ||
| Prior Publication US 2007/0045558 A1, Mar. 01, 2007 | ||
| Int. Cl. G21K 1/08 (2006.01) | ||
| U.S. Cl. 250—396R [250/398; 250/397; 250/307] | 21 Claims |
| 1. A method for determining lens errors in a particle-optical apparatus, which apparatus is designed to scan a sample with
a focused particle beam, comprising:
the supply of a sample with parts having a known shape,
the production of one or more images of the sample by scanning the sample with the particle beam, and
a determination of the cross-section of the beam on the basis of the image or images produced, characterized in that
the sample is a crystalline sample with a free edge, which edge is formed by the edge of a mono-crystal.
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