| US 7,517,498 B2 | ||
| Apparatus for substrate handling | ||
| Joseph P. Fredrick, Palo Alto, Calif. (US) | ||
| Assigned to Agilent Technologies, Inc., Santa Clara, Calif. (US) | ||
| Filed on Aug. 19, 2003, as Appl. No. 10/643,424. | ||
| Prior Publication US 2005/0042768 A1, Feb. 24, 2005 | ||
| Int. Cl. B01L 3/00 (2006.01) | ||
| U.S. Cl. 422—101 [422/102; 422/103; 422/58; 422/68.1; 436/174; 436/177; 436/180] | 15 Claims |
| 1. A device for conducting processing steps on a substrate comprising an array of chemical compounds on a surface thereof,
said device comprising:
(a) a housing comprising a housing chamber configured to retain any fluid introduced into said housing chamber, said fluid
having a meniscus,
(b) an opening in said housing adapted for insertion into said housing chamber of a substrate having a surface comprising
an array of chemical compounds,
(c) a fluid separation mechanism configured to separate fluid in said housing chamber from contact with said substrate in
a controlled manner that preserves the integrity of the fluid meniscus at the atmosphere-fluid interface, wherein said fluid
separation mechanism is a fluid removal mechanism for removing fluid from said housing chamber in said controlled manner,
said fluid removal mechanism comprising a valve having a varying cross-section relative to height of fluid in said housing
chamber,
(d) at least one inlet in fluid communication with said housing chamber, and (e) at least one outlet in fluid communication
with said housing chamber.
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