| US 7,517,087 B2 | ||
| Method and device for the subjective determination of aberrations of higher order | ||
| Manfred Dick, Gefell (Germany); Holger Maeusezahl, Jena (Germany); and Eckhard Schroeder, Eckental (Germany) | ||
| Assigned to Carl Zeiss Meditec AG, Jena (Germany) | ||
| Filed on Dec. 28, 2007, as Appl. No. 11/966,534. | ||
| Application 11/966534 is a continuation of application No. 10/470149, granted, now 7,338,173, previously published as PCT/EP02/00871, filed on Jan. 28, 2002. | ||
| Claims priority of application No. 101 03 763 (DE), filed on Jan. 27, 2001. | ||
| Prior Publication US 2008/0137035 A1, Jun. 12, 2008 | ||
| This patent is subject to a terminal disclaimer. | ||
| Int. Cl. A61B 3/00 (2006.01) | ||
| U.S. Cl. 351—246 [351/205] | 21 Claims |
| 1. A device for a subjective determination of aberrations of higher orders in an optical system, the device comprising:
at least one observation channel; and
a plurality of individual phase-plates aligned with each other and configured to be introduced into the observation channel,
each phase-plate having optically active structures corresponding to a defined Zernike polynomial and to a defined amplitude
of the defined Zernike polynomial, the defined Zernike polynomial having an order higher than two.
|