| US 7,516,833 B2 | ||
| Multi-station workpiece processors, methods of processing semiconductor workpieces within multi-station workpiece processors, and methods of moving semiconductor workpieces within multi-station workpiece processors | ||
| Ryoji Todaka, Shanghai (China) | ||
| Assigned to Advanced Micro-Fabrication Equipment, Inc. Asia, George Town, Grand Cayman (Cayman Islands) | ||
| Filed on Feb. 09, 2006, as Appl. No. 11/351,786. | ||
| Claims priority of application No. 2005 1 0028667 (CN), filed on Aug. 11, 2005. | ||
| Prior Publication US 2007/0034479 A1, Feb. 15, 2007 | ||
| Int. Cl. B65G 15/64 (2006.01) | ||
| U.S. Cl. 198—345.1 [414/222.01; 414/223.01; 414/744.1; 118/729] | 29 Claims |
| 1. A multi-station workpiece processor, comprising:
a processing chamber comprising multiple stations for processing individual workpieces;
a plurality of pedestals, each pedestal associated with individual of the stations, the pedestals being mounted for selective
vertical up movement within the chamber to contact a workpiece and for selective vertical down movement within the chamber
to be displaced from a workpiece, each of the pedestals respectively comprising an upper surface upon which an individual
workpiece is received during processing within the chamber, each of the pedestals further comprising a plurality of lift pins
mounted for vertical up and down movement independent of the movement of the respective pedestal; and
at least one workpiece engagement arm associated with individual of the pedestals, the workpiece engagement arms being movable
between a position received at least partially over individual of the pedestals and a position displaced away from over all
of the pedestals.
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