| US 7,515,783 B2 | ||
| Micro-optic device and method of manufacturing same | ||
| Yoshichika Kato, Tachikawa (Japan); Satoshi Yoshida, Tama (Japan); Keiichi Mori, Tokyo (Japan); Kenji Kondou, Chofu (Japan); Yoshihiko Hamada, Akiruno (Japan); and Osamu Imaki, Hachioji (Japan) | ||
| Assigned to Japan Aviation Electronics Industry Limited, Tokyo (Japan) | ||
| Filed on Sep. 16, 2004, as Appl. No. 10/942,583. | ||
| Claims priority of application No. 2003-340797 (JP), filed on Sep. 30, 2003. | ||
| Prior Publication US 2005/0069246 A1, Mar. 31, 2005 | ||
| Int. Cl. G02B 6/26 (2006.01) | ||
| U.S. Cl. 385—18 [385/16] | 4 Claims |
| 1. A micro-optic device comprising a mirror and one or more structures other than the mirror each formed of a single crystal
silicon layer, wherein
the single crystal silicon layer has a top surface representing (100) silicon crystal plane or (110) silicon crystal plane
and has recesses or channels with sidewall surfaces substantially perpendicular to the top surface;
every surface of the mirror and the one or more structures other than the mirror is formed either by a respective sidewall
surface or a surface which is parallel to the top surface;
the mirror has a side surface which represents (100) silicon crystal plane or (111) silicon crystal plane and is substantially
perpendicular to the top surface, and has unevenness less than that of other sidewall surfaces not representing (100) silicon
crystal plane or (111) silicon crystal plane; and
the side surface has a metal coating film forming a reflective surface.
|