| US 7,515,264 B2 | ||
| Particle-measuring system and particle-measuring method | ||
| Hayashi Otsuki, Nakakoma-gun (Japan); Tsukasa Matsuda, Kitakoma-gun (Japan); and Kyoko Ikeda, Kofu (Japan) | ||
| Assigned to Tokyo Electron Limited, Tokyo (Japan) | ||
| Filed on Dec. 18, 2002, as Appl. No. 10/321,646. | ||
| Application 10/321646 is a continuation in part of application No. 09/594479, filed on Jun. 14, 2000, granted, now 6,532,069. | ||
| Claims priority of application No. 11-168968 (JP), filed on Jun. 15, 1999; and application No. 2001-392703 (JP), filed on Dec. 25, 2001. | ||
| Prior Publication US 2003/0147075 A1, Aug. 07, 2003 | ||
| Int. Cl. G01N 21/00 (2006.01) | ||
| U.S. Cl. 356—338 | 20 Claims |
| 1. A particle measuring system comprising:
a laser beam irradiator, a scattered light detector and a beam stopper,
the particle measuring system being provided in a processing system which generates an atmosphere by exhausting air or a gas
in a processing chamber with a vacuum pump and which applies a process concerning semiconductor device manufacture to an object
to be processed in the atmosphere, and
the particle measuring system being attached to an exhaust pipe connecting an exhaust opening of the processing chamber to
the vacuum pump to emit a laser beam from the laser beam irradiator to a part having the high density of particles included
in an exhaust gas on an outer side away from a center of the exhaust pipe which is exhausted in the exhaust pipe, thereby
detecting scattered light from the particles by the scattered light detector, and measuring the number of the particles included
in the exhaust gas.
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