| US 7,515,246 B2 | ||
| Exposure apparatus, exposure method, and method for producing device | ||
| Hiroyuki Nagasaka, Kumagaya (Japan); and Nobutaka Magome, Kumagaya (Japan) | ||
| Assigned to Nikon Corporation, Tokyo (Japan) | ||
| Filed on Jan. 24, 2006, as Appl. No. 11/337,657. | ||
| Application 11/337657 is a division of application No. 11/147373, filed on Jun. 08, 2005. | ||
| Application 11/147373 is a continuation of application No. PCT/JP03/15735, filed on Dec. 09, 2003. | ||
| Claims priority of application No. 2002-357931 (JP), filed on Dec. 10, 2002. | ||
| Prior Publication US 2006/0132736 A1, Jun. 22, 2006 | ||
| Int. Cl. G03B 27/42 (2006.01); G03B 27/52 (2006.01) | ||
| U.S. Cl. 355—53 [355/30] | 49 Claims |
| 38. An exposure apparatus comprising:
an optical member via which a substrate is exposed to an exposure beam through a liquid; and
a liquid supply system which includes a supply outlet for supplying the liquid from the supply outlet to a space between the
optical member and the substrate, the supply outlet being disposed adjacent to th space;
wherein the liquid supply system includes a liquid flow control member which is located at the supply outlet and by which
a flow of the liquid supplied from the supply outlet is controlled.
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