| US 7,515,234 B2 | ||
| Alignment method using ion beam irradiation | ||
| Yong Sung Ham, Anyang-shi (Korea, Republic of) | ||
| Assigned to LG Display Co., Ltd., Seoul (Korea, Republic of) | ||
| Filed on May 23, 2005, as Appl. No. 11/134,279. | ||
| Claims priority of application No. 10-2004-0036795 (KR), filed on May 24, 2004. | ||
| Prior Publication US 2005/0259204 A1, Nov. 24, 2005 | ||
| Int. Cl. G02F 1/1337 (2006.01) | ||
| U.S. Cl. 349—124 [349/125] | 5 Claims |
| 1. An alignment method, comprising:
forming an alignment film on a substrate;
irradiating an ion beam onto the alignment film at an oblique angle using a bar-type ion gun, as one of the bar-type ion gun
and the substrate moves in a predetermined direction; and
cleaning a surface of the substrate having the alignment film;
wherein irradiating the ion beam satisfies the following equation:
1.6×10−4≤(Lg×I×T)/Ls≤1.6×10−2,
where I is an ion beam current (A) measured outside an ion beam outlet and irradiated from the bar-type ion gun, Lg is a length
(cm) of the ion beam outlet with respect to a moving direction of the substrate, Ls is a length (cm) of the substrate in the
moving direction of the substrate, and T is a process time (sec) for processing one substrate.
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