| US 7,514,935 B2 | ||
| System and method for managing power supplied to a plasma chamber | ||
| Joshua Brian Pankratz, Fort Collins, Colo. (US) | ||
| Assigned to Advanced Energy Industries, Inc., Fort Collins, Colo. (US) | ||
| Filed on Sep. 13, 2006, as Appl. No. 11/531,599. | ||
| Prior Publication US 2008/0061794 A1, Mar. 13, 2008 | ||
| Int. Cl. G01R 31/08 (2006.01); H01H 9/50 (2006.01) | ||
| U.S. Cl. 324—536 | 10 Claims |
| 1. An apparatus comprising:
a first and second output terminals;
a power module configured to provide a voltage with a first polarity to the first and second output terminals, each of the
first and second output terminals adapted to couple with a corresponding one of two conductors of a plasma-chamber-supply
cable; and
an arc-management module connected to the first and second output terminals, the arc-management module configured to provide,
using energy stored in the plasma-chamber-supply cable, a reverse voltage across the first and second output terminals, the
reverse voltage having a polarity that is opposite of the first polarity;
a shunt switch connected between the first and second output terminals and arranged in parallel with the power module so as
to be capable of shunting current from the power module when closed;
a voltage-reversing module arranged in series with the first conductor, the voltage-reversing module configured to carry current
with a series switch from the power module to the first conductor while the first and second output terminals have the first
polarity and receive energy stored in the plasma-chamber-supply cable while the series switch is open so as to be capable
of generating the reverse voltage; and
a control module configured to close the shunt switch and open the series switch so as to enable the voltage-reversing module
to generate the reverse voltage.
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